ITUnano

ITUnano brings together micro/nanofabrication, thin-film deposition, lithography, dry and wet etching, and advanced characterization capabilities within a single research infrastructure.

 
2008
Founding investment supported by the State Planning Organization
230 m²
ISO Class 5–8 cleanroom
770 m²
Research laboratories
USD 13.8 million
State Planning Organization support totaling TRY 32,443,000

Infrastructure and Capabilities

The Center offers researchers an integrated working environment extending from material fabrication to structural and surface characterization.

  • Micro/Nanofabrication
  • Nanolithography and dry/wet etching
  • Thin-film deposition — PVD and CVD
  • Advanced materials characterization
  • Atomistic materials modeling and simulation

Research Focus Areas

Sensors
Photonic and Magnetic Materials
Superconductors and Semiconductors

Mission

To generate knowledge, technology, and highly qualified human resources in functional nanomaterials through interdisciplinary research, advanced infrastructure, and university–industry collaboration.

Vision

To become a nationally and internationally recognized research center in nanotechnology and nanoscience through strong research infrastructure and an innovative approach.

Collaborations

ITUnano is open to joint R&D activities with academia, industry, public institutions, and national and international research centers. It aims to develop innovative technologies through interdisciplinary teams and translate research outcomes into practice.